High rate growth of nanocrystalline diamond films using high microwave power and pure nitrogen/methane/hydrogen plasma
authors Tang, CJ; Fernandes, AJS; Granada, M; Leitao, JP; Pereira, S; Jiang, XF; Pinto, JL; Ye, H
nationality International
journal VACUUM
author keywords Nanocrystalline diamond films; High growth rate; Nitrogen/methane/hydrogen plasma; Nitrogen induced growth rate enhancement; High power MPCVD
abstract In this work, we investigate the impact of minute amounts of pure nitrogen addition into conventional methane/hydrogen mixtures on the growth characteristics of nanocrystalline diamond (NCD) films by microwave plasma assisted chemical vapour deposition (MPCVD), under high power conditions. The NCD films were produced from a gas mixture of 4% CH4/H-2 with two different concentrations of N-2 additive and microwave power ranging from 3.0 kW to 4.0 kW, while keeping all the other operating parameters constant. The morphology, grain size, microstructure and texture of the resulting NCD films were characterized by using scanning electron microscope (SEM), micro-Raman spectroscopy and X-ray diffraction (XRD) techniques. N-2 addition was found to be the main parameter responsible for the formation and for the key change in the growth characteristics of NCD films under the employed conditions. Growth rates ranging from 5.4 mu m/h up to 9.6 mu m/h were achieved for the NCD films, much higher than those usually reported in the literature. The enhancing factor of nitrogen addition on NCD growth rate was obtained by comparing with the growth rate of large-grained microcrystalline diamond films grown without nitrogen and discussed by comparing with that of single crystal diamond through theoretical work in the literature. This achievement on NCD growth rate makes the technology interesting for industrial applications where fast coating of large substrates is highly desirable. (C) 2015 Elsevier Ltd. All rights reserved.
issn 0042-207X
year published 2015
volume 122
beginning page 342
ending page 346
digital object identifier (doi) 10.1016/j.vacuum.2015.03.021
web of science category Materials Science, Multidisciplinary; Physics, Applied
subject category Materials Science; Physics
unique article identifier WOS:000364732200018
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