Mechanical strain engineering of dielectric tunability in polycrystalline SrTiO3 thin films
authors Tkach, A; Okhay, O; Reaney, IM; Vilarinho, PM
nationality International
journal JOURNAL OF MATERIALS CHEMISTRY C
keywords FERROELECTRICITY; CRYSTAL
abstract Optimizing performance using low cost scalable processing and substrates is critical if functional oxide thin films are to achieve commercialisation. Here, we present a comprehensive investigation of the role of low cost Al2O3, SrTiO3, and MgO substrates in the structure, microstructure and electrical properties of SrTiO3 (ST) thin films, deposited by sol-gel processing. We demonstrate that the dielectric properties of polycrystalline ST films depend on the strain/stress induced by the substrates. ST films deposited on Al2O3/Pt substrates under a high tensile stress possess the smallest grain size and present the lowest value of the relative permittivity, er, with the lowest dielectric tunability. In contrast, ST films deposited on MgO/Pt substrates, under the highest compressive stress, have the highest value of er, tunability and polarization. It is thus demonstrated that for polycrystalline ST films the relative permittivity and dielectric tunability may be optimised through an induced compressive stress state.
publisher ROYAL SOC CHEMISTRY
issn 2050-7526
year published 2018
volume 6
issue 10
beginning page 2467
ending page 2475
digital object identifier (doi) 10.1039/c8tc00414e
web of science category Materials Science, Multidisciplinary; Physics, Applied
subject category Materials Science; Physics
unique article identifier WOS:000428997500008
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5 year journal impact factor 5.688
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