Imprint behavior and polarization relaxation of PLZT thin films
authors Araujo, EB; Melo, M; Ivanov, M; Shur, VY; Kholkin, AL
nationality International
journal FERROELECTRICS
author keywords PLZT; polarization relaxation; thin films
keywords PIEZORESPONSE FORCE MICROSCOPY; PIEZOELECTRIC PROPERTIES; FERROELECTRIC CERAMICS; STATE
abstract Thickness dependence of imprint and polarization dynamics of Pb1-xLax(Zr1-yTiy)(1-x/4)O-3 (PLZT) thin films is reported in this work. Asymmetries in the histograms of the local piezoresponse reveal an imprint effect in the studied films whose origin could be associated to Schottky barriers near the film-substrate interface. Time-resolved spectroscopic measurements shows that the local polarization relaxation follows the exponential dependence . A maximum relaxation time approximate to 2.18s was observed for the 350nm thick film. A similar thickness dependence between grain size, correlation length () and relaxation time () suggest an intrinsic relationship between them.
publisher TAYLOR & FRANCIS LTD
issn 0015-0193
year published 2018
volume 533
issue 1
beginning page 10
ending page 18
digital object identifier (doi) 10.1080/00150193.2018.1470821
web of science category Materials Science, Multidisciplinary; Physics, Condensed Matter
subject category Materials Science; Physics
unique article identifier WOS:000459872300003
  ciceco authors
  impact metrics
journal analysis (jcr 2019):
journal impact factor 0.669
5 year journal impact factor 0.718
category normalized journal impact factor percentile 9.089
dimensions (citation analysis):
altmetrics (social interaction):



 


Sponsors

1suponsers_list_ciceco.jpg