The role of surface activation prior to seeding on CVD diamond adhesion
authors Amaral, M; Almeida, F; Fernandes, AJS; Costa, FM; Oliveira, FJ; Silva, RF
nationality International
journal SURFACE & COATINGS TECHNOLOGY
author keywords CVD diamond; Surface activation; Nucleation; Adhesion; HFCVD
keywords SILICON-NITRIDE; RAMAN-SCATTERING; THIN-FILMS; NUCLEATION; DEPOSITION; GROWTH; PRETREATMENTS; QUALITY; HFCVD; NCD
abstract A special surface pre-treatment protocol consisting of four steps is proposed to provide high adhesion levels for CVD diamond by hot-filament technique. In step 1, the silicon nitride ceramic substrates are surface ground with 15 mu m diamond slurry and mirror-like polished with colloidal silica (0.05 mu m). In step 2, plasma etching with CF(4) (PE), mechanical anchoring is promoted due to the surface roughness increment. Surface activation (SA) is the following step, where the substrates are subjected to CVD diamond growth conditions for a short time (30 min), leading to the deposition of an amorphous carbon layer responsible for enhancing the nucleation density and the further growth of diamond during early stages of deposition. The final step 4 is 0.5-1 mu m diamond powder seeding in an ultrasonic bath. The results show that the Si(3)N(4) ceramic surface modified by the surface pre-treatment protocol allowed a high nucleation density promoting a continuous and homogeneous film of equally sized diamond grains, at a growth rate of ap. 1.5 mu m h(-1). Brale tip indentation tests confirmed that highly adherent films are thus produced (no delamination under 900 N). (C) 2010 Elsevier B.V. All rights reserved.
publisher ELSEVIER SCIENCE SA
issn 0257-8972
year published 2010
volume 204
issue 21-22
beginning page 3585
ending page 3591
digital object identifier (doi) 10.1016/j.surfcoat.2010.04.031
web of science category Materials Science, Coatings & Films; Physics, Applied
subject category Materials Science; Physics
unique article identifier WOS:000279696400033
  ciceco authors
  impact metrics
times cited (wos core): 8
journal impact factor (jcr 2016): 2.589
5 year journal impact factor (jcr 2016): 2.538
category normalized journal impact factor percentile (jcr 2016): 76.334
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