Volta Potential of Oxidized Aluminum Studied by Scanning Kelvin Probe Force Microscopy
authors Yasakau, KA; Salak, AN; Zheludkevich, ML; Ferreira, MGS
nationality International
journal JOURNAL OF PHYSICAL CHEMISTRY C
keywords OXIDE FILM GROWTH; THERMAL-OXIDATION; ATOMIC-FORCE; CORROSION-INHIBITORS; FILIFORM CORROSION; IONIC DIFFUSION; METAL CRYSTALS; SURFACE; KINETICS; ALLOY
abstract The Volta potential difference (VPD) of oxide layers formed on an aluminum surface as a result of anodization in a neutral solution of boric acid, thermal oxidation in air, and immersion in boiling water was studied by scanning Kelvin probe force microscopy. The measured VPD value was correlated with the layer thickness. It has been suggested that the measured VPD value is contributed by induced potential from the charges trapped by defects. Provided that the defects created during oxidation and thereby the embedded charges are mainly concentrated at the film borders, the induced potential depends linearly on film thickness. The observed difference in the linear dependence of VPD on the thickness of anodic films has been explained in terms of their charge distribution profiles. The effect of annealing in air on the VPD of the anodic films has been associated with charge redistribution and partial disappearance of the defects. It was shown that, on annealing, the VPD of the anodic films tends to the equilibrium level which is the VPD value for a nonanodized film thermally oxidized at the given annealing temperature.
publisher AMER CHEMICAL SOC
issn 1932-7447
year published 2010
volume 114
issue 18
beginning page 8474
ending page 8484
digital object identifier (doi) 10.1021/jp1011044
web of science category Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary
subject category Chemistry; Science & Technology - Other Topics; Materials Science
unique article identifier WOS:000277280800049
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journal impact factor (jcr 2016): 4.536
5 year journal impact factor (jcr 2016): 4.796
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