Diamond film adhesion onto sub-micrometric WC-Co substrates
authors Almeida, FA; Soares, E; Fernandes, AJS; Sacramento, J; Silva, RF; Oliveira, FJ
nationality International
journal VACUUM
author keywords CVD diamond; Tungsten carbide; Adhesion
keywords CVD; COATINGS; NUCLEATION; DEPOSITION; CRYSTALS; SURFACE; STEEL
abstract Different chemical etching procedures (CF(4) plasma, Aqua regia, and two-step Murakami/Aqua regia) were compared as surface pre-treatments for CVD diamond deposition onto sub-micrometric WC-Co hardmetal grades with cobalt contents of 3.5 and 5.75 wt% Co. Adhesion tests by static indentation up to 1100 N revealed the superior behaviour of the latter when pre-treated by the combined two-step etching for which no film spalling-off is observed at the maximum applied load. An interfacial crack resistance of about 1.6 kgf/mu m was estimated anticipating high adhesion levels. (C) 2011 Elsevier Ltd. All rights reserved.
publisher PERGAMON-ELSEVIER SCIENCE LTD
issn 0042-207X
year published 2011
volume 85
issue 12
beginning page 1135
ending page 1139
digital object identifier (doi) 10.1016/j.vacuum.2010.12.025
web of science category Materials Science, Multidisciplinary; Physics, Applied
subject category Materials Science; Physics
unique article identifier WOS:000292678900021
  ciceco authors
  impact metrics
times cited (wos core): 5
journal impact factor (jcr 2016): 1.530
5 year journal impact factor (jcr 2016): 1.553
category normalized journal impact factor percentile (jcr 2016): 40.962
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