Magnesium metallic interlayer as an oxygen-diffusion-barrier between high-kappa dielectric thin films and silicon substrate
authors Rauwel, E; Rauwel, P; Ducroquet, F; Sunding, MF; Matko, I; Lourenco, AC
nationality International
journal THIN SOLID FILMS
author keywords High-kappa; Dielectric; Diffusion barrier; Sputtering
keywords RAY PHOTOELECTRON-SPECTROSCOPY; ATOMIC-LAYER DEPOSITION; GATE DIELECTRICS; HFO2 FILMS; ELECTRICAL-PROPERTIES; CRYSTALLINE OXIDES; INTERFACE; STABILITY; MOCVD; SI
abstract The deposition of a thin magnesium metallic interlayer on an Si substrate prior to the deposition of an oxide thin film using rf-sputtering was investigated. The deposition of high-kappa HfO2 thin film was more particularly studied and it was demonstrated that the metallic interlayer acts as an oxygen barrier, preventing the formation of a low-kappa layer at the high-kappa/Si interface during the deposition. A post-deposition annealing treatment performed on the films induced the diffusion of the metal barrier into the HfO2 film and allowed obtaining a sharp interface. However, the degree of diffusion depends not only on the interlayer thickness, but also on the thickness of the high-kappa film. X-ray photoelectron spectroscopy was used to study the degree of oxidation of the Mg interlayer. High resolution transmission electron microscopy and energy filtered transmission electron microscopy were used to characterize the films and the diffusion of the Mg interlayer into the high-kappa film after annealing. In this work we will stress on the engineering of the interface via the diffusion of the Mg interlayer during the growth process and on annealing. (C) 2012 Elsevier B.V. All rights reserved.
publisher ELSEVIER SCIENCE SA
issn 0040-6090
year published 2012
volume 520
issue 17
beginning page 5602
ending page 5609
digital object identifier (doi) 10.1016/j.tsf.2012.04.029
web of science category Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
subject category Materials Science; Physics
unique article identifier WOS:000305770200021
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