Pressure-dependent large area synthesis and electronic structure of MoS2
authors Sharma, DK; Ramana, EV; Fateixa, S; Hortiguela, MJ; Otero-Irurueta, G; Nogueira, HIS; Kholkin, A
nationality International
journal MATERIALS RESEARCH BULLETIN
author keywords Transition metal dichalcogenides (TMDs); Chemical vapor deposition (CVD); MoS2; HR-XPS; UV-visible
keywords TRANSITION-METAL DICHALCOGENIDES; CHEMICAL-VAPOR-DEPOSITION; SINGLE-LAYER MOS2; MOLYBDENUM-DISULFIDE; MONOLAYER MOS2; ATOMIC LAYERS; THIN-LAYERS; RAMAN-SCATTERING; PHASE GROWTH; GRAPHENE
abstract Molybdenum disulfide (MoS2) is a transition metal dichalcogenide, which along with graphene, has a great potential to become a material of choice for the next generation of nanoelectronics. We report the synthesis of a large-area MoS2 obtained by sulfurization of MoO3 using chemical vapor deposition (CVD) at different Ar base pressures. The optimal pressure for the growth was found to be similar to 50 mbar (millibar). The evolution of MoS2 phase as a function of Ar gas pressure was monitored by confocal Raman spectroscopy. As synthesized MoS2 shows direct bandgap of 1.6 eV evaluated by UV-vis spectroscopy. We report for the first time the valence band spectra and the work function of MoS2 on SiO2/Si calculated by ultraviolet photoemission spectroscopy, which was found to be 4.67 eV. In-situ electrical measurements demonstrated expected semiconducting behavior of the grown triangular crystals. These studies show MoS2 crystallites growth by controlling the parameters in CVD process.
publisher PERGAMON-ELSEVIER SCIENCE LTD
issn 0025-5408
year published 2018
volume 97
beginning page 265
ending page 271
digital object identifier (doi) 10.1016/j.materresbull.2017.09.007
web of science category Materials Science, Multidisciplinary
subject category Materials Science
unique article identifier WOS:000417659100039
  ciceco authors
  impact metrics
journal analysis (jcr 2017):
journal impact factor 2.873
5 year journal impact factor 2.527
category normalized journal impact factor percentile 68.246
dimensions (citation analysis):
altmetrics (social interaction):



 


Apoio

1suponsers_list_ciceco.jpg