Synthesis and structural characterization of highly < 1 0 0 >-oriented {100}-faceted nanocrystalline diamond films by microwave plasma chemical vapor deposition
authors Tang, CJ; Pereira, SMS; Fernandes, AJS; Neves, AJ; Gracio, J; Bdikin, IK; Soares, MR; Fu, LS; Gu, LP; Kholkin, AL; Carmo, MC
nationality International
journal JOURNAL OF CRYSTAL GROWTH
author keywords Characterization; Chemical vapor deposition process; Nanomaterials; Diamond
keywords ULTRANANOCRYSTALLINE DIAMOND; THIN-FILMS; NITROGEN ADDITION; MATERIALS SCIENCE; GROWTH; CVD; MORPHOLOGY; SURFACE; NUCLEATION; OXYGEN
abstract We report the synthesis and characterization of high-quality highly <1 0 0> oriented nanocrystalline diamond (NCD) films consisting of {1 0 0} nano-facets with a high growth rate of 2.6 mu m/h. The NCD samples were grown on large (1 0 0) silicon wafers of 5.08 cm in diameter by employing CH(4)/H(2)/O(2)/N(2) chemistries without the aid of bias for orientation, microwave power 3 kW and the substrate temperature about 700 degrees C using a 5 kW-type high-power microwave plasma chemical vapor deposition (CVD) system. The strong <1 0 0> preferred orientation is unambiguously demonstrated by a detailed crystallographic texture analysis and the conventional X-ray diffraction. Moreover, a detailed morphological characterization by the high-resolution scanning electron microscopy (SEM) and the atomic force microscopy (AFM), reveal that the growth surface consists of square (1 0 0) facets with an average size of about 60 nm and has a cylindrical microstructure. We demonstrate that the root-mean-square surface roughness as low as similar to 15 nm, measured by AFM on 1 mu m(2) scan areas, can be obtained even for considerably thick (76 mu m) films. The high quality of these films is confirmed by the Raman and Fourier-transformer infrared spectra. The high-quality smooth <1 0 0>-oriented {1 0 0}-faceted NCD films may have high potential in mechanical, tribological and micro-electromechanical system (MEMS) applications. (C) 2009 Elsevier B.V. All rights reserved.
publisher ELSEVIER SCIENCE BV
issn 0022-0248
year published 2009
volume 311
issue 8
beginning page 2258
ending page 2264
digital object identifier (doi) 10.1016/j.jcrysgro.2009.01.130
web of science category Crystallography; Materials Science, Multidisciplinary; Physics, Applied
subject category Crystallography; Materials Science; Physics
unique article identifier WOS:000266351600003
  ciceco authors
  impact metrics
journal analysis (jcr 2017):
journal impact factor 1.742
5 year journal impact factor 1.736
category normalized journal impact factor percentile 42.363
dimensions (citation analysis):
altmetrics (social interaction):



 


Apoio

1suponsers_list_ciceco.jpg