Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications
authors Marichy, C; Bechelany, M; Pinna, N
nationality International
journal ADVANCED MATERIALS
author keywords atomic layer deposition; nanostructured materials; energy applications; environmental applications
keywords SENSITIZED SOLAR-CELLS; YTTRIA-STABILIZED ZIRCONIA; SNO2 THIN-FILMS; TIO2 NANOTUBE ARRAYS; OXIDE FUEL-CELLS; TIN OXIDE; CARBON NANOTUBES; GAS SENSORS; IRON-OXIDE; PLATINUM NANOPARTICLES
abstract Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It proved to be a key technology for the surface modification and the fabrication of complex nanostructured materials. In this Progress Report, after a short introduction to ALD and its chemistry, the versatility of the technique for the fabrication of novel functional materials will be discussed. Selected examples, focused on its use for the engineering of nanostructures targeting applications in energy conversion and storage, and on environmental issues, will be discussed. Finally, the challenges that ALD is now facing in terms of materials fabrication and processing will be also tackled.
publisher WILEY-V C H VERLAG GMBH
issn 0935-9648
year published 2012
volume 24
issue 8
beginning page 1017
ending page 1032
digital object identifier (doi) 10.1002/adma.201104129
web of science category Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter
subject category Chemistry; Science & Technology - Other Topics; Materials Science; Physics
unique article identifier WOS:000300447900002
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journal analysis (jcr 2017):
journal impact factor 21.950
5 year journal impact factor 21.888
category normalized journal impact factor percentile 97.478
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