Electrochemical deposition of lead and tellurium into barrierless nanoporous anodic aluminium oxide
authors Ivanou, DK; Ivanova, YA; Lisenkov, AD; Zheludkevich, ML; Streltsov, EA
nationality International
journal ELECTROCHIMICA ACTA
author keywords Alumina; Tellurium; Electrodeposition; Lead; Underpotential deposition
keywords HIGH-ASPECT-RATIO; NANOWIRE ARRAYS; PULSED ELECTRODEPOSITION; AAO TEMPLATE; FABRICATION; SUBSTRATE; DISSOLUTION; GROWTH; TE
abstract Electrochemical deposition of Pb and Te into barrierless nanoporous aluminium oxide films on Ti substrates was studied. Porous anodic alumina on Ti was prepared by two-step anodization in oxalic acid of Al layer sputtered on Ti. The barrier layer was eliminated by the controllable acidic treatment of anodized samples. The effectiveness of the barrier layer dissolution was studied electrochemically using lead deposition-oxidation test reaction. Electrodeposition of Te into porous anodic alumina films was found to proceed with overvoltage related both to nucleation barrier and diffusion limitation in the pores. Lead underpotential deposition on Te particles electrodeposited in anodic alumina films was considered. It is characterized by high irreversibility due to the effective chemical interaction between Te nanoparticles and lead adatoms resulting in PbTe nanoparticles formation. Crown Copyright (C) 2012 Published by Elsevier Ltd. All rights reserved.
publisher PERGAMON-ELSEVIER SCIENCE LTD
issn 0013-4686
year published 2012
volume 77
beginning page 65
ending page 70
digital object identifier (doi) 10.1016/j.electacta.2012.05.061
web of science category Electrochemistry
subject category Electrochemistry
unique article identifier WOS:000307131300010
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journal impact factor 6.215
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