Domain structure evolution in relaxor PLZT 8/65/35 ceramics after chemical etching and electron beam irradiation
authors Gimadeeva, LV; Shikhova, VA; Chezganov, DS; Merzliakova, AS; Vlasov, EO; Fedorovyh, VV; Kholkin, AL; Malic, B; Shur, VY
nationality International
journal FERROELECTRICS
author keywords Relaxor ferroelectrics; piezoresponse force microscopy; selective chemical etching; polarization reversal; electron beam irradiation; domain structures
keywords PIEZORESPONSE FORCE MICROSCOPY; THIN-FILMS; FERROELECTRICS; RELAXATION; DISORDER; KINETICS; STATE
abstract Domain structure and its evolution on the surface of PLZT 8/65/35 ceramics after selective chemical etching and e-beam irradiation was studied. It is shown that the initial mixture of the nanoscale fractal-type 3D maze (fractal dimension 2.8) and micron-size domains turned into lamellar domains with periods ranging from 100 to 800 nm as a result of such procedures. The observed etch-induced change of the domain structure was attributed to the action of the depolarization field after partial removing the screening charges. The dependence of the switched domain area on irradiation time (dose) was measured in e-beam irradiated samples.
publisher TAYLOR & FRANCIS LTD
issn 0015-0193
year published 2018
volume 525
issue 1
beginning page 83
ending page 92
digital object identifier (doi) 10.1080/00150193.2018.1432933
web of science category Materials Science, Multidisciplinary; Physics, Condensed Matter
subject category Materials Science; Physics
unique article identifier WOS:000427943200011
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  impact metrics
journal impact factor (jcr 2016): 0.551
5 year journal impact factor (jcr 2016): 0.534
category normalized journal impact factor percentile (jcr 2016): 10.014
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