Alexander Tselev
  Investigador Principal  
  telefone: 234370332  
  extensão: 23101  
  departamento: Física  
  grupo: 2 - nanoestruturas e cerâmicos ferróicos multifuncionais
  linha: 1 - tecnologias da informação e comunicação
  url directo:  
Short CV

Nizhny Novgorod State University, Russia B.Sc./M.Sc. 1991 Radiophysics and Electronics (Summa Cum Laude)
Dresden University of Technology, Germany, Ph.D. 2000, Materials Science (Magna Cum Laude)
Professional Experience 
2016 – present Principal Researcher, CICECO-Aveiro Institute of Materials, Department of Physics, University of Aveiro, Aveiro, Portugal
2009–2016 Research Assistant Professor, Joint Faculty, Oak Ridge National Laboratory/University of Tennessee, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory and Department of Physics and Astronomy, University of Tennessee, Knoxville, TN, USA

2006–2009 Research Associate, Duke University, Durham, NC, USA

2003–2006 Post Doctoral Fellow, Georgetown University , Washington, DC, USA 

2001–2003 Post Doctoral Research Associate, University of Maryland College Park, MD, USA 
1997–2001 Scientific Employee, Dresden University of Technology, Germany
1991–1997 Junior Research Scientist, Institute of Applied Physics / Institute for Physics of Microstructures, Russian Academy of Sciences, Russia
Professional and Synergistic Activities
Referee for Nature Nanotechnology, Physical Review Letters, Physical Review B, ACS Nano, Applied Physics Letters, and other journals.
Honors and Awards

2017 Tan Chin Tuan Exchange Fellowship in Engineering, Nanyang Technological University, Singapore
European Materials Research Society (E-MRS) Graduate Student Award (1998).
Research Synopsis

  1. Physics of nanoscale phase transitions and heat transport, materials for informationstorage and energy storage and conversion, as well as physics, applications, and development of various scanning probe microscopy imaging modalities for nanoscale functional characterization of materials. 
  2. Near-field scanning microwave microscopy. We apply and develop near-field scanning microwave microscopy to study local electrical properties of a broad class of material: dielectrics, semiconductors, two-dimensional conductors (such as graphene), and structures based on these materials.
  3. In-situ Scanning Probe Microscopy of Complex Oxides. In-situ UHV scanning probe microscopy techniques are used to study surfaces of complex oxide thin films grown by Pulsed Laser Deposition / Laser MBE. 
orientações científicas em curso