A new regime for high rate growth of nanocrystalline diamond films using high power and CH4/H-2/N-2/O-2 plasmaTang, CJ; Abe, I; Fernandes, AJS; Neto, MA; Gu, LP; Pereira, S; Ye, H; Jiang, XF; Pinto, JL 2011, DIAMOND AND RELATED MATERIALS, 20, 3, 304-309.
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