Turning periodic mesoporous organosilicas selective to CO2/CH4 separation: deposition of aluminium oxide by atomic layer depositionLourenco, MAO; Silva, RM; Silva, RF; Pinna, N; Pronier, S; Pires, J; Gomes, JRB; Pintof, ML; Ferreira, P 2015, JOURNAL OF MATERIALS CHEMISTRY A, 3, 45, 22860-22867.
|