Nanocrystalline diamond coating of silicon nitride ceramics by microwave plasma-assisted CVD

resumo

The thermal and chemical compatibility of silicon nitride ceramics (Si3N4) to diamond ensures an adequate adhesion for tribological applications, such as mechanical seals, biomaterials or cutting tools for hard machining operations. Most of the recent research efforts on these components focused on nanocrystalline diamond (NCD) due to its small grain size and surface smoothness. The present study reports for the first time NCD coating Of Si3N4 substrates by microwave plasma-assisted chemical vapour deposition (MPACVD) using Ar/H-2/CH4 gas mixture and varying the substrate temperature (650-1050 degrees C) and deposition time. Optimal deposition conditions result in growth rates up to 3.0 mu m h(-1) that allowed the production of continuous NCD films with low roughness (Ra approximate to 22 nm) and grain size of about 10 nm at the lower temperatures and longer deposition times. (c) 2004 Elsevier B.V. All rights reserved.

palavras-chave

CHEMICAL-VAPOR-DEPOSITION; FILM GROWTH; THIN-FILMS; ADHESION; TRANSPOLYACETYLENE; NUCLEATION; HYDROGEN; BEHAVIOR; WEAR

categoria

Materials Science; Physics

autores

Amaral, M; Mohasseb, F; Oliveira, FJ; Benedic, F; Silva, RF; Gicquel, A

nossos autores

Partilhe este projeto

Publicações similares

Usamos cookies para atividades de marketing e para lhe oferecer uma melhor experiência de navegação. Ao clicar em “Aceitar Cookies” você concorda com nossa política de cookies. Leia sobre como usamos cookies clicando em "Política de Privacidade e Cookies".