Pulsed injection metal organic chemical vapour deposition and characterisation of thin CaO films
authors Borges, RP; Ferreira, P; Saraiva, A; Goncalves, R; Rosa, MA; Goncalves, AP; da Silva, RC; Magalhaes, S; Lourenco, MJV; Santos, FJV; Godinho, M
nationality International
journal PHYSICA B-CONDENSED MATTER
author keywords CaO; Pulsed injection MOCVD; RBS
keywords MOCVD; DECOMPOSITION; GROWTH; OXIDES; MGO
abstract Thin films of CaO were grown on silicon (Si) and lanthanum aluminate (LaAIO(3)) substrates by pulsed injection metal-organic chemical vapour deposition in a vertical injection MOCVD system. Growth parameters were systematically varied to study their effect on film growth and quality and to determine the optimal growth conditions for this material. Film quality and growth rate were evaluated by atomic force microscopy, X-ray diffraction and Rutherford Backscattering Spectroscopy measurements. Optimised conditions allowed growing transparent, single phase films textured along the (001) direction. (C) 2009 Elsevier B.V. All rights reserved.
publisher ELSEVIER SCIENCE BV
issn 0921-4526
year published 2009
volume 404
issue 8-11
beginning page 1398
ending page 1403
digital object identifier (doi) 10.1016/j.physb.2008.12.031
web of science category Physics, Condensed Matter
subject category Physics
unique article identifier WOS:000265886100068
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