authors |
Ferreira, I; Vilarinho, P; Fernandes, F; Fortunato, E; Martins, R |
editors |
Vieira, T |
nationality |
International |
journal |
ADVANCED MATERIALS FORUM I |
author keywords |
doped silicon thin films; hot-wire plasma-assisted technique; hydrogen dilution |
abstract |
P- and n-type silicon thin films have been produced using a new hot wire plasma assisted deposition process that combines the conventional plasma enhanced chemical vapor deposition and the hot wire techniques. The films were produced in the presence of different hydrogen gas flow and their optoelectronic, structural and compositional properties have been studied. The optimized optoelectronic results achieved for n-type Si:H films are conductivity at room temperature of 9.4(Omegacm)(-1) and optical band gap of 2eV while for p-type SiC:H films these values are 1x10(-2)(Omegacm)(-1) and 1.6 eV, respectively. The films exhibit the required optoelectronic characteristics and compactness for device applications such as solar cells. |
publisher |
TRANS TECH PUBLICATIONS LTD |
issn |
1013-9826 |
isbn |
0-87849-905-9 |
year published |
2002 |
volume |
230-2 |
beginning page |
591 |
ending page |
594 |
web of science category |
Materials Science, Ceramics; Materials Science, Composites |
subject category |
Materials Science |
unique article identifier |
WOS:000179553200137
|
ciceco authors
impact metrics
altmetrics (social interaction):
|
|
|