Pulsed injection metal organic chemical vapour deposition and characterisation of thin CaO films

resumo

Thin films of CaO were grown on silicon (Si) and lanthanum aluminate (LaAIO(3)) substrates by pulsed injection metal-organic chemical vapour deposition in a vertical injection MOCVD system. Growth parameters were systematically varied to study their effect on film growth and quality and to determine the optimal growth conditions for this material. Film quality and growth rate were evaluated by atomic force microscopy, X-ray diffraction and Rutherford Backscattering Spectroscopy measurements. Optimised conditions allowed growing transparent, single phase films textured along the (001) direction. (C) 2009 Elsevier B.V. All rights reserved.

palavras-chave

MOCVD; DECOMPOSITION; GROWTH; OXIDES; MGO

categoria

Physics

autores

Borges, RP; Ferreira, P; Saraiva, A; Goncalves, R; Rosa, MA; Goncalves, AP; da Silva, RC; Magalhaes, S; Lourenco, MJV; Santos, FJV; Godinho, M

nossos autores

agradecimentos

This work was financed by the Portuguese Foundation for Science and Technology (FCT) through project PPCDT/FIS/60153/2004.

Partilhe este projeto

Publicações similares

Usamos cookies para atividades de marketing e para lhe oferecer uma melhor experiência de navegação. Ao clicar em “Aceitar Cookies” você concorda com nossa política de cookies. Leia sobre como usamos cookies clicando em "Política de Privacidade e Cookies".