Adjacent to the cleanroom facilities (ISL) there is a technical area equipped with pass-boxes, that ensure safe and efficient material and sample transfer between cleanroom and non-cleanroom areas. Auxiliary equipments (e.g., vacuum pumps, gas cylinders, chillers) are also located in the technical area. Inside the cleanroom there is access to: de-ionized and ultrapure water, fume hoods for wet chemistry (FASTER ChemFAST 15), worktables, compressed air and N2 gas lines, chilled water circuit.
WebpageAbout Clean Room Facility
Thin film deposition:
RF magnetron sputtering technique
Langmuir-Blodgett Troughs technique
For external services send an email to: fis-isl-registo@ua.pt with a short description of the experimental work.
Access to the cleanroom and cleanroom equipment is dependent on authorization and technical training.
For registration and booking send an email to: fis-isl-registo@ua.pt.
João Amaral
Scientific Coordinator
Rute Ferreira
Scientific Coordinator
Ricardo Silva
Cleanroom Technician
Instruments
RF magnetron sputtering thin film deposition system with 3 targets, substrate heating up to 900ºC in UHV chamber with turbomolecular pump. Atmosphere monitoring with atomic mass spectrometry. This system allows the preparation of layered and/or co-sputtered heterostructures with thickness control. Oxygen is also provided for the controlled preparation of oxide materials. Metal or metal alloys sputtering including Au, Ag, Al, Cr, Cu, Fe, Co, FeCo, TiN. Insulator sputtering including SiO2, Al2O3.
NIMA611M/2B/ASP
Langmuir-Blodgett Troughs to create thin film coatings with controlled packing density. Langmuir-Blodgett films consist of mono-molecular layers stacked sequentially onto a solid substrate.