X-ray Photoelectron Spectroscopy (XPS) is an advanced surface analysis technique enabling quantitative determination of elemental composition and chemical states of materials. The system integrates a high-intensity X-ray source (XR-50) with a monochromator (Focus 500), providing high photon flux, flexible energy selection, and stable operation under ultra-high vacuum (UHV) conditions.
The emitted photoelectrons are analyzed using a hemispherical electron energy analyzer (PHOIBOS), enabling high-resolution energy measurements. The system is based on an integrated UHV platform ensuring minimal contamination and reliable surface-sensitive analysis.
Precise control of experimental parameters, including pressure, temperature, and excitation energy, allows investigation of surface chemistry, thin films, and functional materials. The system incorporates high-voltage power supplies, interlock mechanisms, and shielding solutions to ensure safe and reproducible operation in accordance with radiation safety requirements.
WebpageAbout XPS Facility
X-ray Photoelectron Spectroscopy (XPS) analysis. The service includes data acquisition only; data analysis (e.g. spectral fitting) is not included.
Researchers may use CasaXPS software on the XPS workstation for data processing, subject to prior scheduling.
Internal services (TEMA and CICECO)
TEMA and CICECO researchers have access to XPS analysis through technical supporting staff. All researchers are required to complete a form in order to make a booking.
External services (outside UA)
External access is available upon request via email: ciceco-xps@ua.pt
Alexandre Bastos
Scientific Coordinator
Sergey Mikhalev
Technician
Email
ciceco-xps@ua.pt
Room
3.2.7, 1st floor (TEMA), Building 3
Instruments
Multi-technique system for surface chemical analysis based on X-ray Photoelectron Spectroscopy (XPS).
XPS is a surface-sensitive analytical technique providing quantitative information on elemental composition and chemical states. It is highly sensitive to the outermost atomic layers, enabling detailed characterization of surface chemistry under ultra-high vacuum (UHV) conditions.
Analysis of XPS spectra allows identification of elements present at the surface and determination of their chemical environment through binding energy measurements. Quantitative analysis can be performed by comparing peak areas, enabling estimation of atomic concentrations and surface stoichiometry.
The system is suitable for a wide range of materials, including thin films, powders, single crystals, metals, oxides, ceramics, and composite materials, supporting applications in materials science, energy systems, and surface engineering.