Experimental Studies of Electron Affinity and Work Function from Aluminium on Oxidized Diamond (100) and (111) Surfaces
authors James, MC; Cattelan, M; Fox, NA; Silva, RF; Silva, RM; May, PW
nationality International
journal PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS
author keywords aluminium termination; CVD diamond; negative electron affinity; thermionic emission; work function
keywords SCHOTTKY-BARRIER HEIGHT; BORON-DOPED DIAMOND; EMISSION; LAYER; SPECTROSCOPY; METALS; STATES; FILMS
abstract Three different procedures are used to deposit aluminium onto O-terminated (100) and (111) boron-doped diamond, with the aim of producing a thermally stable surface with low work function and negative electron affinity. The methods are 1) deposition of a > 20 nm film of Al by high-vacuum evaporation followed by HCl acid wash to remove excess metallic Al, 2) deposition of <3 angstrom of Al by atomic layer deposition, and 3) thin-film deposition of Al by electron beam evaporation. The surface structure, work function, and electron affinity are investigated after annealing at temperatures of 300, 600, and 800 degrees C. Except for loss of excess O upon first heating, the Al + O surfaces remain stable up to 800 degrees C. The electron affinity values are generally between 0.0 and -1.0 eV, and the work function is generally 4.5 +/- 0.5 eV, depending upon the deposition method, coverage, and annealing temperature. The values are in broad agreement with those predicted by computer simulations of Al + O (sub)monolayers on a diamond surface.
publisher WILEY-V C H VERLAG GMBH
issn 0370-1972
isbn 1521-3951
year published 2021
volume 258
issue 7
digital object identifier (doi) 10.1002/pssb.202100027
web of science category 13
subject category Physics, Condensed Matter
unique article identifier WOS:000647225500001
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