Effect of annealing and electrical properties of high-kappa thin films grown by atomic layer deposition using carboxylic acids as oxygen source

resumo

Titania and hafnia thin films were deposited by atomic layer deposition using metal alkoxides and carboxylic acids as oxygen source. The effect of annealing under nitrogen on the densification of the films and on the resulting electrical properties is presented. The as-deposited and annealed films demonstrate good dielectric permittivity and low leakage current densities due to their purity and amorphous character. (C) 2009 American Vacuum Society. [DOI: 10.1116/1.3058743]

palavras-chave

HIGH DIELECTRIC-CONSTANT; NONAQUEOUS SYNTHESIS; DIOXIDE FILMS; OXIDE; HAFNIUM; HFO2; WATER; NANOSTRUCTURES; SILICON; ROUTES

categoria

Engineering; Science & Technology - Other Topics; Physics

autores

Rauwel, E; Ducroquet, F; Rauwel, P; Willinger, MG; Matko, I; Pinna, N

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