Lattice Location Studies of the Amphoteric Nature of Implanted Mg in GaN
authors Wahl, U; Correia, JG; Costa, ARG; David-Bosne, E; Kappers, MJ; da Silva, MR; Lippertz, G; Lima, TAL; Villarreal, R; Vantomme, A; Pereira, LMC
nationality International
journal ADVANCED ELECTRONIC MATERIALS
author keywords acceptor doping; amphoteric dopants; channeling; GaN; ion implantation; lattice location; Mg
keywords MAGNESIUM-ION-IMPLANTATION; GALLIUM NITRIDE; DEFECTS; TOOL
abstract Despite the renewed interest in ion implantation doping of GaN, efficient electrical activation remains a challenge. The lattice location of Mg-27 is investigated in GaN of different doping types as a function of implantation temperature and fluence at CERN's ISOLDE facility. The amphoteric nature of Mg is elucidated, i.e., the concurrent occupation of substitutional Ga and interstitial sites: following room temperature ultra-low fluence (approximate to 2 x 10(10) cm(-2)) implantation, the interstitial fraction of Mg is highest (20-24%) in GaN pre-doped with stable Mg during growth, and lowest (2-6%) in n-GaN:Si, while undoped GaN shows an intermediate interstitial fraction of 10-12%. Both for p- and n-GaN prolonged implantations cause interstitial Mg-27 to approach the levels found for undoped GaN. Implanting above 400 degrees C progressively converts interstitial Mg to substitutional Ga sites due to the onset of Mg interstitial migration (estimated activation energy 1.5-2.3 eV) and combination with Ga vacancies. In all sample types, implantations above a fluence of 10(14) cm(-2) result in >95% substitutional Mg. Ion implantation is hence a very efficient method to introduce Mg into substitutional Ga sites, i.e., challenges toward high electrical activation of implanted Mg are not related to lack of substitutional incorporation.
publisher WILEY
issn 2199-160X
year published 2021
volume 7
issue 9
digital object identifier (doi) 10.1002/aelm.202100345
web of science category 10
subject category Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied
unique article identifier WOS:000663379000001
  ciceco authors
  impact metrics
journal analysis (jcr 2019):
journal impact factor 6.593
5 year journal impact factor 6.831
category normalized journal impact factor percentile 79.688
dimensions (citation analysis):
altmetrics (social interaction):



 


Sponsors

1suponsers_list_ciceco.jpg