Diamond film adhesion onto sub-micrometric WC-Co substrates

resumo

Different chemical etching procedures (CF(4) plasma, Aqua regia, and two-step Murakami/Aqua regia) were compared as surface pre-treatments for CVD diamond deposition onto sub-micrometric WC-Co hardmetal grades with cobalt contents of 3.5 and 5.75 wt% Co. Adhesion tests by static indentation up to 1100 N revealed the superior behaviour of the latter when pre-treated by the combined two-step etching for which no film spalling-off is observed at the maximum applied load. An interfacial crack resistance of about 1.6 kgf/mu m was estimated anticipating high adhesion levels. (C) 2011 Elsevier Ltd. All rights reserved.

palavras-chave

CVD; COATINGS; NUCLEATION; DEPOSITION; CRYSTALS; SURFACE; STEEL

categoria

Materials Science; Physics

autores

Almeida, FA; Soares, E; Fernandes, AJS; Sacramento, J; Silva, RF; Oliveira, FJ

nossos autores

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