Diamond film adhesion onto sub-micrometric WC-Co substrates

abstract

Different chemical etching procedures (CF(4) plasma, Aqua regia, and two-step Murakami/Aqua regia) were compared as surface pre-treatments for CVD diamond deposition onto sub-micrometric WC-Co hardmetal grades with cobalt contents of 3.5 and 5.75 wt% Co. Adhesion tests by static indentation up to 1100 N revealed the superior behaviour of the latter when pre-treated by the combined two-step etching for which no film spalling-off is observed at the maximum applied load. An interfacial crack resistance of about 1.6 kgf/mu m was estimated anticipating high adhesion levels. (C) 2011 Elsevier Ltd. All rights reserved.

keywords

CVD; COATINGS; NUCLEATION; DEPOSITION; CRYSTALS; SURFACE; STEEL

subject category

Materials Science; Physics

authors

Almeida, FA; Soares, E; Fernandes, AJS; Sacramento, J; Silva, RF; Oliveira, FJ

our authors

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