Nano to micrometric HFCVD diamond adhesion strength to Si3N4


In the present study, hot filament chemical vapour deposition technique was used to grow diamond films from nanometric to microcrystalline grain sizes. Their adhesion levels to a silicon nitride ceramic were compared after Brale tip indentation testing. The best behaviour was attained by the microcrystalline diamond (MCD) grade due to its higher crystallinity and superior hardness. In contrast, nanocrystalline diamond (NCD) coatings showed the less effective chemical bonding to the ceramic substrate due to the higher degree of sp(2) content. The MCD coating supported a normal load of 1600 N without spalling-off and presented an interfacial crack resistance of 12.0 N mu m(-1), much better than that reported until the present. This behaviour may be attributed to the CF4 plasma pre-treatment of the substrate. (C) 2007 Elsevier Ltd. All rights reserved.



subject category

Materials Science; Physics


Almeida, FA; Amaral, M; Oliveira, FJ; Fernandes, AJS; Silva, RF

our authors

Share this project:

Related Publications

We use cookies for marketing activities and to offer you a better experience. By clicking “Accept Cookies” you agree with our cookie policy. Read about how we use cookies by clicking "Privacy and Cookie Policy".