abstract
Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It proved to be a key technology for the surface modification and the fabrication of complex nanostructured materials. In this Progress Report, after a short introduction to ALD and its chemistry, the versatility of the technique for the fabrication of novel functional materials will be discussed. Selected examples, focused on its use for the engineering of nanostructures targeting applications in energy conversion and storage, and on environmental issues, will be discussed. Finally, the challenges that ALD is now facing in terms of materials fabrication and processing will be also tackled.
keywords
SENSITIZED SOLAR-CELLS; YTTRIA-STABILIZED ZIRCONIA; SNO2 THIN-FILMS; TIO2 NANOTUBE ARRAYS; OXIDE FUEL-CELLS; TIN OXIDE; CARBON NANOTUBES; GAS SENSORS; IRON-OXIDE; PLATINUM NANOPARTICLES
subject category
Chemistry; Science & Technology - Other Topics; Materials Science; Physics
authors
Marichy, C; Bechelany, M; Pinna, N
our authors
Nicola Pinna
ResearcherGroups
Projects
Nanotubes and Nanowires based hybrid nanostructures (PTDC/CTM/098361/2008)
Hierarchical Nanostructures for Lithium-Ion Batteries (PTDC/CTM-NAN/110776/2009)
acknowledgements
This work was partially supported by the WCU (World Class University) program through the National Research Foundation (NRF) of Korea funded by the Ministry of Education, Science and Technology (R31-10013) and FCT projects (PTDC/CTM/098361/2008), (PTDC/CTM-NAN/110776/2009) and (SFRH/BD/71453/2010). Dr. Mato Knez from NanoGUNE is acknowledged for critical reading of the manuscript and fruitful discussion.