Polycrystalline silicon obtained by metal induced crystallization using different metals


The aim of this paper is to study the role of different metals (aluminium, molybdenum, nickel and titanium) in inducing crystallization in films produced by LPCVD at high and low temperature processes and to compare the structural, morphological, optical and electrical properties of the various films produced. This work envisages the use of the most suitable conditions that lead to the production of films for optoelectronic applications such as solar cells. (C) 2003 Elsevier B.V. All rights reserved.




Materials Science; Physics


Pereira, L; Aguas, H; Martins, RMS; Vilarinho, P; Fortunato, E; Martins, R

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