resumo
We report the synthesis and characterization of high-quality highly <1 0 0> oriented nanocrystalline diamond (NCD) films consisting of {1 0 0} nano-facets with a high growth rate of 2.6 mu m/h. The NCD samples were grown on large (1 0 0) silicon wafers of 5.08 cm in diameter by employing CH(4)/H(2)/O(2)/N(2) chemistries without the aid of bias for orientation, microwave power 3 kW and the substrate temperature about 700 degrees C using a 5 kW-type high-power microwave plasma chemical vapor deposition (CVD) system. The strong <1 0 0> preferred orientation is unambiguously demonstrated by a detailed crystallographic texture analysis and the conventional X-ray diffraction. Moreover, a detailed morphological characterization by the high-resolution scanning electron microscopy (SEM) and the atomic force microscopy (AFM), reveal that the growth surface consists of square (1 0 0) facets with an average size of about 60 nm and has a cylindrical microstructure. We demonstrate that the root-mean-square surface roughness as low as similar to 15 nm, measured by AFM on 1 mu m(2) scan areas, can be obtained even for considerably thick (76 mu m) films. The high quality of these films is confirmed by the Raman and Fourier-transformer infrared spectra. The high-quality smooth <1 0 0>-oriented {1 0 0}-faceted NCD films may have high potential in mechanical, tribological and micro-electromechanical system (MEMS) applications. (C) 2009 Elsevier B.V. All rights reserved.
palavras-chave
ULTRANANOCRYSTALLINE DIAMOND; THIN-FILMS; NITROGEN ADDITION; MATERIALS SCIENCE; GROWTH; CVD; MORPHOLOGY; SURFACE; NUCLEATION; OXYGEN
categoria
Crystallography; Materials Science; Physics
autores
Tang, CJ; Pereira, SMS; Fernandes, AJS; Neves, AJ; Gracio, J; Bdikin, IK; Soares, MR; Fu, LS; Gu, LP; Kholkin, AL; Carmo, MC
nossos autores
agradecimentos
Dr. C.J. Tang and Dr. L.S. Fu are grateful for getting funds from the Foundation of Science and Technology (FCT), Portugal.