Interplay of Magnetic Properties and Doping in Epitaxial Films of h-REFeO3 Multiferroic Oxides
authors Baghizadeh, A; Vaghefi, PM; Huang, X; Borme, J; Almeida, B; Salak, AN; Willinger, MG; Amaral, VB; Vieira, JM
nationality International
journal SMALL
author keywords electron microscopy; epitaxy; ferroelectricity; first‐ principles calculations; magnetic oxides
abstract Multiferroic materials demonstrating coexistence of magnetic and ferroelectric orders are promising candidates for magnetoelectric devices. While understanding the underlying mechanism of interplaying of ferroic properties is important, tailoring their properties to make them potential candidates for magnetoelectric devices is challenging. Here, the antiferromagnetic Neel ordering temperature above 200 K is realized in successfully stabilized epitaxial films of (Lu,Sc)FeO3 multiferroic oxide. The first-principles calculations show the shrinkage of in-plane lattice constants of the unit cells of the films on different substrates which corroborates well the enhancement of the Neel ordering temperature (T-N). The profound effect of lattice strain/stress at the interface due to differences of in-plane lattice constants on out of plane magnetic properties and on spin reorientation temperature in the antiferromagnetic region is further elucidated in the epitaxial films with and without buffer layer of Mn-doped LuFeO3. Writing and reading ferroelectric domains reveal the ferroelectric response of the films at room temperature. Detailed electron microscopy shows the presence of lattice defects in atomic scale. First-principles calculations show that orbital rehybridization of rare-earth ions and oxygen is one of the main driving force of ferroelectricity along c-axis in thin films of hexagonal ferrites.
publisher WILEY-V C H VERLAG GMBH
issn 1613-6810
isbn 1613-6829
year published 2021
volume 17
issue 11
digital object identifier (doi) 10.1002/smll.202005700
web of science category 12
subject category Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter
unique article identifier WOS:000620559100001
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journal analysis (jcr 2019):
journal impact factor 11.459
5 year journal impact factor 10.611
category normalized journal impact factor percentile 91.017
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