Nanocrystalline diamond coating of silicon nitride ceramics by microwave plasma-assisted CVD
authors Amaral, M; Mohasseb, F; Oliveira, FJ; Benedic, F; Silva, RF; Gicquel, A
nationality International
journal THIN SOLID FILMS
author keywords nanocrystalline diamond; film growth and characterization; MPACVD; silicon nitride
keywords CHEMICAL-VAPOR-DEPOSITION; FILM GROWTH; THIN-FILMS; ADHESION; TRANSPOLYACETYLENE; NUCLEATION; HYDROGEN; BEHAVIOR; WEAR
abstract The thermal and chemical compatibility of silicon nitride ceramics (Si3N4) to diamond ensures an adequate adhesion for tribological applications, such as mechanical seals, biomaterials or cutting tools for hard machining operations. Most of the recent research efforts on these components focused on nanocrystalline diamond (NCD) due to its small grain size and surface smoothness. The present study reports for the first time NCD coating Of Si3N4 substrates by microwave plasma-assisted chemical vapour deposition (MPACVD) using Ar/H-2/CH4 gas mixture and varying the substrate temperature (650-1050 degrees C) and deposition time. Optimal deposition conditions result in growth rates up to 3.0 mu m h(-1) that allowed the production of continuous NCD films with low roughness (Ra approximate to 22 nm) and grain size of about 10 nm at the lower temperatures and longer deposition times. (c) 2004 Elsevier B.V. All rights reserved.
publisher ELSEVIER SCIENCE SA
issn 0040-6090
year published 2005
volume 482
issue 1-2
beginning page 232
ending page 236
digital object identifier (doi) 10.1016/j.tsf.2004.11.140
web of science category Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
subject category Materials Science; Physics
unique article identifier WOS:000229681500041
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journal impact factor 2.03
5 year journal impact factor 1.884
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