abstract
Very smooth CVD diamond films are used as direct coatings on Si3N4 tool substrates. By adjusting deposition parameters, namely Ar/H-2 and CH4/H-2 gas ratios, and substrate temperature, nano- (27 nm) and submicrometric (43 nm) crystallite sized grades were produced in a hot filament reactor. Also, a conventional 5 and 12 mu m micrometric grain size types were produced for comparison. Normalized coated inserts were tested for dry turning of WC-25 wt.% Co hardmetal. All the CVD diamond grades endured the hardmetal turning showing slight cratering, having the flank wear as the main wear mode. Their turning performance was distinct, as a consequence of morphology and surface roughness characteristics. Among all the tested tools, the more even surface and the submicrometric grade presented the best behaviour regarding cutting forces, tool wear and workpiece surface finishing. For this coating, the depth-of-cut force attained the lowest value, 150 N, the best combination of wear types (KM=30 mu m, KT=2 mu m and VB= 110 mu m) and workpiece surface finishing (Ra=0.2 mu m). (c) 2006 Elsevier B.V. All rights reserved.
keywords
CHEMICAL-VAPOR-DEPOSITION; CUTTING TOOLS; CVD; FILMS; PERFORMANCE; ADHESION
subject category
Materials Science
authors
Almeida, FA; Amaral, M; Oliveira, FJ; Silva, RF
our authors
Filipe José Alves de Oliveira
Principal Researcher
Flávia Aparecida de Almeida
Post-doc Fellowship