Bioactive glass thin films deposited by magnetron sputtering technique: The role of working pressure

abstract

Bioglass coatings were prepared by radio frequency magnetron sputtering deposition at low temperature (150 degrees C) onto silicon substrates. The influence of argon pressure values used during deposition (0.2 Pa, 0.3 Pa and 0.4 Pa) on the short-range structure and biomineralization potential of the bioglass coatings was studied. The biomineralization capability was evaluated after 30 days of immersion in simulated body fluid. SEM-EDS, XRD and FTIR measurements were performed. The tests clearly showed strong biomineralization features for the bioglass films. The thickness of the chemically grown hydroxyapatite layers was more than twice greater for the BG films deposited at the highest working pressure, in comparison to those grown on the films obtained at lower working pressures. The paper attempts to explain this experimental fact based on structural and compositional considerations. (C) 2010 Elsevier B.V. All rights reserved.

keywords

PULSED-LASER DEPOSITION; CAO-MGO-SIO2 SYSTEM; STRUCTURAL-ANALYSIS; P2O5 ADDITIVES; COATINGS; HYDROXYAPATITE; TITANIUM; BIOGLASS; SURFACE; BONE

subject category

Chemistry; Materials Science; Physics

authors

Stan, GE; Marcov, DA; Pasuk, I; Miculescu, F; Pina, S; Tulyaganov, DU; Ferreira, JMF

our authors

acknowledgements

Thanks are due to CICECO for the support and to the Portuguese Foundation for Science and Technology for the fellowship grant of S. Pina (SFRH/BPD/64119/2009) and to Romanian Ministry of Education and Research for the scientific project and financial support (CNMP PN II 71-110/2007). The financial support of

Share this project:

Related Publications

We use cookies for marketing activities and to offer you a better experience. By clicking “Accept Cookies” you agree with our cookie policy. Read about how we use cookies by clicking "Privacy and Cookie Policy".